MELVILLE, N.Y.--(BUSINESS WIRE)--Canon U.S.A. Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., is developing a next-generation semiconductor lithography system employing nanoimprint technology that makes possible sub-20 nm1 high-resolution processes. Within the leading-edge high-resolution patterning segment, where 193 nm multiple patterning has become mainstream and EUV (extreme ultraviolet)2 continues to remain in development, in 2004, Canon be
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