JENA, Germany--(BUSINESS WIRE)--The new ZEISS MeRiT neXT mask repair tool hosts the innovative ZEISS low energy ebeam column, which enables the repair of smallest possible clear and opaque defects with the highest accuracy. The low energy beam increases the process resolution and simultaneously reduces side effects. The redeveloped chemical toolbox allows a massively enhanced selectivity and addresses more blank types including EUV and high durable Phase Shifting Masks (HD PSM). The ZEISS MeRiT
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